reactive ion plating

A Study on Optical Coatings by Reactive Ion Plating

光学薄膜反应离子镀技术研究

This article mainly describes the preparation of ZnO thin films with highly orientation using RF reactive ion plating , RF reactive sputtering , MOCVD , and laser-assist evaporation , etc.

本文主要叙述采用RF反应离子镀、RF反应溅射、MOCVD和激光辅助蒸发等方法制备高度取向的ZnO薄膜。

A Mathematical Model for Optical Films Deposited by Reactive Ion Plating

等离子体镀光学薄膜的数学模型

Plasma Ion Source for Low Voltage Reactive Ion Plating

低压反应离子镀等离子源的研制

Plasma physics of optical film deposition by reactive ion plating

离子镀光学薄膜的等离子体物理过程

Study on the Properties of Corrosion Resistance of Palladium Film on Titanium Substrate Formed by Reactive Ion Beam Plating

钛表面反应离子束镀钯膜的耐腐蚀性

The influence of the activating source power on tin coatings deposited on the matrix of HSS by reactive sputtering ion plating

活化源功率对高速钢基体反应溅射离子镀TiN涂层的影响

Physical process of reactive low voltage ion plating

低压反应离子镀的物理过程

Preparation of ITO films by reactive low voltage ion plating

低压反应离子镀方法制备ITO透明导电膜

Study of single layer inhomogeneous Ge_ ( 1-x ) C_x antireflection coating prepared by reactive low voltage ion plating technique

用低压反应离子镀的方法制备Ge（1-x）Cx单层非均匀增透膜的研究

High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique , which is different to the most common sputtering method to deposit ITO film .

溅射镀膜方法是制备ITO透明导电膜最常用也是实验研究最多的方法。